METHOD OF PREPARATION OF PHOTOMASKS IN THE PROCESS OF MANUFACTURING LAYER OR BOARD WITH CIRCUIT PRINTED ON BOTH SIDESJA SLOJA ILI PLATY S PECHATNOJJ SKHEMOJJ NA OBEIKH EE STORONAKH,申请号PL19780210691-传众专利搜索

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发明名称	METHOD OF PREPARATION OF PHOTOMASKS IN THE PROCESS OF MANUFACTURING LAYER OR BOARD WITH CIRCUIT PRINTED ON BOTH SIDESJA SLOJA ILI PLATY S PECHATNOJJ SKHEMOJJ NA OBEIKH EE STORONAKH
摘要
申请公布号	PL119900(B1)	申请公布日期	1982.01.30
申请号	PL19780210691	申请日期	1978.11.03
申请人		发明人
分类号	B41B;H05K3/06;(IPC1-7):H05K3/06	主分类号	B41B
代理机构		代理人
主权项
地址

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