System and method for deflecting and focusing a broad plasma beam.

摘要

A method and system for deflecting a broad ion plasma beam including an ion source (1) for forming an ion plasma, an extraction means (7, 9) for extracting a broad ion plasma beam from the ion plasma, and deflection means including a non-grounded surface (12) located in the path of the ion plasma beam and at an angle to the path for deflecting the ion plasma beam to a target material. A grounded, screen grid (13) is located in front of the deflecting means in the path of the ion plasma. The screen grid has openings which permit passage of the ions in the ion plasma, but block passage of the electrons. The plasma beam is deflected by the deflected means and the grounded, screen grid onto the target material (15) for sputter cleaning, deposition and ion milling applications.