发明名称 Metal oxide film, laminate, metal member and process for producing the same
摘要 A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
申请公布号 US9476137(B2) 申请公布日期 2016.10.25
申请号 US201213463315 申请日期 2012.05.03
申请人 Tohoku University;Mitsubishi Chemical Corporation 发明人 Ohmi Tadahiro;Shirai Yasuyuki;Morinaga Hitoshi;Kawase Yasuhiro;Kitano Masafumi;Mizutani Fumikazu;Ishikawa Makoto
分类号 C25D11/06;C25D11/18 主分类号 C25D11/06
代理机构 Oblon, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A metal oxide film manufacturing method for manufacturing an amorphous barrier metal oxide film for use as a coating film for protecting a structural member of a semiconductor or flat panel display manufacturing apparatus, said method comprising: anodizing a metal or metal alloy containing aluminum as a main component in an anodization solution of pH 4 to 10 and at an anodization voltage of 150V or greater, thereby obtaining the amorphous barrier metal oxide film on the structural member of a semiconductor or the flat panel display manufacturing apparatus formed of an oxide of the metal or metal alloy containing aluminum as the main component, wherein the anodization solution comprises mainly at least one nonaqueous solvent selected from the group consisting of ethylene glycol, diethylene glycol, triethylene glycol, and tetraethylene glycol and the ratio of water to the nonaqueous solvent is 40 mass % or less based on the total amount of water and the total amount of the non-aqueous solvent, and wherein the anodization solution further comprises at least one electrolyte selected from the group consisting of boric acid, phosphoric acid, organic carboxylic acid, and salts thereof, and wherein said metal or metal alloy containing aluminum has a total content of iron, copper, manganese, zinc, and chromium of 0.01 mass % or less, wherein said amorphous barrier metal oxide film has a thickness of 10 nm to 1 μm and a water release amount from said amorphous barrier metal oxide film is 1E18 molecules/cm2 or less.
地址 Sendai-shi JP
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