发明名称 Developer mixture and process for developing exposed negative-working diazonium salt layers
摘要 The invention relates to a developer mixture for developing exposed, light-sensitive reproduction layers which contain a diazonium salt polycondensation product. The mixture comprises water, a salt of an alkanoic acid and a surfactant and contains 0.5 to 15 percent by weight, in particular 1 to 10 percent by weight, of at least one salt of an alkanoic acid having 8 to 13 carbon atoms and 0.5 to 20 percent by weight, in particular 1 to 12 percent by weight, of at least one low-foaming, nonionic surfactant. These surfactants preferably include optionally modified block polymers formed from ethylene oxide and propylene oxide. The invention also relates to a process for developing negative-working reproduction layers, of the composition indicated above, with the developer mixture according to the invention.
申请公布号 US4395480(A) 申请公布日期 1983.07.26
申请号 US19820337396 申请日期 1982.01.06
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 SPRINTSCHNIK, GERHARD
分类号 G03C5/18;G03F7/32;(IPC1-7):G03C1/58;G03C5/30 主分类号 G03C5/18
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