| 摘要 |
PURPOSE:To completely exfoliate poly (fluoroalkyl alpha-haloacrylate) and copolymer by a method wherein an organic solution in which a base was dissolved is used as an exfoliating solution. CONSTITUTION:The exfoliating solution is made by dissolving 0.5-30wt% or thereabout of an inorganic or organic base such as NaOH, methoxy Na and the like into petroleum ether and the like. When the resist, consisting of a single polymer of acrylic monomer of the prescribed structure having the alkyl wherein X was substituted by F, Cl and Br and H was replaced by one or more of F, or a copolymer wherein two or more of said monomer groups, or a copolymer wherein said monomer and other vinyl monomer, is soaked in the prepared exfoliating solution of 15-70 deg.C for 0.5-15min or thereabout or the exfoliating solution is sprayed on the resist, the resistor is brought into the state of low molecular weight by creating the reaction such as dehydrogen-chloride, hydrolysis, principal chain cleavage and the like by a base, and at the same time, the resist is turned to a water soluble state. Accordingly, when the above is processed by pure water after treatment by the exfoliating solution, the residue of polymer can be removed completely. |
