发明名称 Semiconductor element capable of withstanding high voltage
摘要 A semiconductor element such as a thyristor or a transistor which is capable of withstanding a high voltage comprises a semiconductor substrate of a pnpn-four layer structure (for a thyristor) or of a npn-three layer structure (for a transistor). An intermediate p-type layer is composed of a low concentration layer region located adjacent to an n-type layer and a high concentration layer region located adjacent to the other n-type layer. The high concentration layer region is formed through diffusion of aluminium so that the maximum concentration thereof becomes at least equal to 5x1016 atoms/cm3. A method of manufacturing such semiconductor element is also disclosed.
申请公布号 US4402001(A) 申请公布日期 1983.08.30
申请号 US19780868791 申请日期 1978.01.12
申请人 HITACHI, LTD. 发明人 MOMMA, NAOHIRO;TANIGUCHI, HIROYUKI
分类号 H01L29/73;H01L21/223;H01L21/331;H01L29/08;H01L29/10;H01L29/36;H01L29/74;H01L29/861;(IPC1-7):H01L29/74;H01L29/06 主分类号 H01L29/73
代理机构 代理人
主权项
地址