发明名称 Semiconductor integrated circuit
摘要 Well regions of p-type are disposed in a surface region of an n-type Si substrate of a semiconductor integrated circuit. The p-type well regions are arranged in the shape of islands, and various semiconductor elements are formed in the p-type well islands. The substrate surface region between the p-type well islands is filled with a depletion layer, and an interconnection layer is disposed on an insulating film over that body region contained within the depletion layer.
申请公布号 US4419684(A) 申请公布日期 1983.12.06
申请号 US19810224946 申请日期 1981.01.14
申请人 HITACHI, LTD. 发明人 SAKAI, YOSHIO;NAKAMURA, HIDEO
分类号 H01L21/822;H01L21/765;H01L21/768;H01L23/522;H01L27/04;H01L27/06;H01L27/088;(IPC1-7):H01L27/04 主分类号 H01L21/822
代理机构 代理人
主权项
地址