发明名称 RAW MATERIAL FOR CHEMICAL VAPOR DEPOSITION COMPRISING ORGANIC PLATINUM COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING THE RAW MATERIAL FOR CHEMICAL VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a CVD platinum compound that can be formed into a film at a low temperature, and has sufficient thermal stability during storage and at a vaporization stage.SOLUTION: The present invention provides a CVD platinum compound in which a diimine comprising two imines, and an alkyl anion are coordinated to a divalent platinum represented by the formula, the CVD platinum compound having a high vapor pressure and a low decomposition temperature [R-Rare H, a C5 or less alkyl group, cyano group or the like; Rand R, alkyl anions, independently represent a C1-3 alkyl group].SELECTED DRAWING: Figure 2
申请公布号 JP2016210741(A) 申请公布日期 2016.12.15
申请号 JP20150096976 申请日期 2015.05.12
申请人 TANAKA KIKINZOKU KOGYO KK 发明人 HARADA RYOSUKE;SHIGETOMI TOSHIYUKI;SUZUKI KAZUHARU;NABEYA SHUNICHI;KUMAKURA AKIKO;AOYAMA TATSUKI;SONE TAKAYUKI
分类号 C07F15/00;C23C16/18 主分类号 C07F15/00
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