| 摘要 |
PURPOSE:To provide the titled apparatus having low gas-releasing function and low chemical reaction function, and capable of growing a desired thin film crystal on a substrate by opening and closing a crucible having built-in molecular beam source and placed in an ultra-high vacuum atmosphere, with an improved shutter. CONSTITUTION:The crucible 2 containing the evaporation molecular beam source 3 is placed in a chamber which can be maintained at ultra-high vacuum. The heater 4 and the shielding reflector 1 are placed to the circumference of the crucible 2, and the closeable shutter 5 is attached at the opening of the crucible 2. The face of the shutter 5 opposite to the crucible 2 is made of the same material as the crucible, and the cooling element 10 or the heating element 9 is attached to the reverse side of the shutter 5. The vessel 27 containing the evaporation molecular beam source 3 of the crucible 2 is surrounded by the heater 20, and the heater is further surrounded by the shielding reflector 1 and the second heater 21. |
