| 摘要 |
This invention relates to an electron gun assembly for use, for example, in x-ray lithography, which includes an electron emitter assembly, beam forming elements disposed adjacent the electron emitter assembly, a target plane disposed in spaced relationship with respect to the electron emitter assembly, a deflector disposed adjacent the path of the electrons emitted from the electron emitter assembly, a pseudoanode mounted in spaced relationship with respect to the deflector and to the electron emitter assembly and to the target plane, said electron emitter assembly being interposed between the pseudoanode and the target plane. |
