发明名称 |
Production of relief images or resist images by a negative-working method |
摘要 |
Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.
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申请公布号 |
US4465760(A) |
申请公布日期 |
1984.08.14 |
申请号 |
US19830525394 |
申请日期 |
1983.08.22 |
申请人 |
BASF AKTIENGESELLSCHAFT |
发明人 |
LEYRER, REINHOLD J.;SAENGER, DIETRICH;KLINSMANN, UWE |
分类号 |
G03F7/038;G03F7/004;G03F7/039;G03F7/20;G03F7/38;(IPC1-7):G03F7/10;G03C1/49;G03C1/71;G03C5/16 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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