Method of making a magnetic film target for sputtering

摘要

A method of making a magnetic film target for use in sputtering characterized by forming a film of a magnetic material on a substrate by ion-plating a raw magnetic material thereon. The raw magnetic material is either identical with the magnetic film material or an ingredient or ingredients for constituting it. In the latter case, one or more metallic ingredients are simultaneously ion-plated in the same system to form a magnetic alloy or compound film on the substrate. To prepare a magnetic alloy target in which the composition changes in the thickness direction, the ion plating ratio of respective metallic ingredients is changed with time.