发明名称 CONTINUOUS PLASMA TREATING DEVICE
摘要 PURPOSE:To enable to perform a plasma treatment with favorable uniformity and reproducibility, by a method wherein two or more sets of plasma-generating electrodes are provided with probes, and electric power supplied to each of the electrodes is controlled in accordance with plasma characteristics obtained by the probes. CONSTITUTION:Power sources 4 are independently fitted respectively to two or more sets of plasma-generating electrodes 3, and one or more sets of probes 8 for measuring plasma characteristics are provided for each set of electrodes 3, and a means 10 for adjusting the electric power supplied to each of the electrodes 3 in accordance with the plasma characteristics obtained by the probes 8 is provided for the power source 4 for each set. Accordingly, a continuous plasma treatment effected by the passage of a material 11 to be treated along a long path can be performed stably, uniformly and with favorable reproducibility.
申请公布号 JPS59183827(A) 申请公布日期 1984.10.19
申请号 JP19830056742 申请日期 1983.03.31
申请人 NIPPON GOSEI GOMU KK 发明人 YANAGIHARA KENJI;KIMURA MITSUO;SHINKAI MASAHIRO
分类号 C23F4/00;B01J19/08;C23C14/54;C23C14/56;C23C16/50;C23F1/08 主分类号 C23F4/00
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