发明名称 |
Screen engraving photo etching - uses half tone method of exposing film via diffusing layer and half tone in five stages |
摘要 |
<p>Screen engraving is by photo etching using a half-tone positive by exposing a light-sensitive material through an engraving screen with the required number of transparent transverse lines. The light-sensitive material is exposed to the light source via the half-tone positive. The light-sensitive material is exposed to the light source through a diffusion layer between the half-tone and the film. The sensitive material used can be a carbon resist (1) which is made sensitive by submerging in a solution of potassium dichromate and drying. The engraving is carried out in five stages.</p> |
申请公布号 |
NL8402375(A) |
申请公布日期 |
1984.12.03 |
申请号 |
NL19840002375 |
申请日期 |
1984.07.27 |
申请人 |
TOPPAN PRINTING CO. LTD. TE TOKIO. |
发明人 |
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分类号 |
G03F5/20;(IPC1-7):03F5/20 |
主分类号 |
G03F5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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