发明名称 Screen engraving photo etching - uses half tone method of exposing film via diffusing layer and half tone in five stages
摘要 <p>Screen engraving is by photo etching using a half-tone positive by exposing a light-sensitive material through an engraving screen with the required number of transparent transverse lines. The light-sensitive material is exposed to the light source via the half-tone positive. The light-sensitive material is exposed to the light source through a diffusion layer between the half-tone and the film. The sensitive material used can be a carbon resist (1) which is made sensitive by submerging in a solution of potassium dichromate and drying. The engraving is carried out in five stages.</p>
申请公布号 NL8402375(A) 申请公布日期 1984.12.03
申请号 NL19840002375 申请日期 1984.07.27
申请人 TOPPAN PRINTING CO. LTD. TE TOKIO. 发明人
分类号 G03F5/20;(IPC1-7):03F5/20 主分类号 G03F5/20
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