| 发明名称 |
Photomask with corrected white defects |
| 摘要 |
A photomask with white defects that have corrected with a film comprising a mixture of silver and tantalum oxide. The film has a good resistance to chemicals.
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| 申请公布号 |
US4510222(A) |
申请公布日期 |
1985.04.09 |
| 申请号 |
US19830496245 |
申请日期 |
1983.05.19 |
| 申请人 |
HITACHI, LTD. |
发明人 |
OKUNAKA, MASAAKI;MIZUKOSHI, KATSURO;HONGO, MIKIO;MIYAUCHI, TATEOKI |
| 分类号 |
C09D1/00;C09D10/00;C09D11/00;G03F1/00;G03F1/08;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
C09D1/00 |
| 代理机构 |
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