发明名称 TRANSPARENT ENAMEL FRIT HAVING LOW SOFTENING POINT
摘要 PURPOSE:The titled enamel frit, consisting of SiO2, B2O3, Na2O, K2O, Li2O, CaO, BaO, Al2O3, ZrO2, F2, MoO3, MnO2 and Fe2O3, and having improved dipping characteristics, water resistance and adhesion under low-grade treating conditions. CONSTITUTION:An enamel frit, prepared by incorporating 32-45wt% SiO2 with 7-20wt% B2O3, 14-22wt% Na2O, 0.4-5wt% K2O, 0.3-2wt% Li2O, 1.5-15wt% CaO, 1.5-15wt% BaO, 0.5-5wt% Al2O3, 0.5-4.5wt% ZrO2, 2-9wt% F2, 0.4- 5wt% MoO3, 0.1-2wt% MnO2, 0.3-2wt% Fe2O3 and if necessary 0.1-5wt% ZnO and <=3wt% at least one component selected from MgO, SrO, TiO2, SnO2 and V2O5, and melting the resultant mixture under heating.
申请公布号 JPS60108345(A) 申请公布日期 1985.06.13
申请号 JP19830212741 申请日期 1983.11.11
申请人 MATSUSHITA DENKI SANGYO KK 发明人 TOKUMITSU SHIYUUZOU;OOYABU HAJIME;NOBUTOU YOSHIYASU;HOSHIDA YUKINOBU;NISHINO ATSUSHI;IKEDA MASAKI;WATANABE YOSHIHIRO
分类号 C03C3/064;C03C8/02;C03C8/06 主分类号 C03C3/064
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