发明名称 |
X-RAY MASK |
摘要 |
An X-ray mask having a mask pattern formed from nickel or a material having nickel as a principal component supported on a thin membrane. The X-ray mask has characteristics substantially equal to those of the conventional X-ray mask employing Au as a mask pattern and is much lower in price than the Au-containing mask pattern. In addition, since the X-ray mask can easily be formed by electroless plating, it is possible to form a mask pattern with a higher accuracy than that in case of employing Au alone. |
申请公布号 |
EP0103844(A3) |
申请公布日期 |
1985.07.03 |
申请号 |
EP19830109046 |
申请日期 |
1983.09.13 |
申请人 |
HITACHI, LTD. |
发明人 |
KIMURA, TAKESHI;OBAYASHI, HIDEHITO;MOCHIJI, KOZO |
分类号 |
G03F1/00;G03F1/22;G03F1/68;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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