发明名称 X-RAY MASK
摘要 An X-ray mask having a mask pattern formed from nickel or a material having nickel as a principal component supported on a thin membrane. The X-ray mask has characteristics substantially equal to those of the conventional X-ray mask employing Au as a mask pattern and is much lower in price than the Au-containing mask pattern. In addition, since the X-ray mask can easily be formed by electroless plating, it is possible to form a mask pattern with a higher accuracy than that in case of employing Au alone.
申请公布号 EP0103844(A3) 申请公布日期 1985.07.03
申请号 EP19830109046 申请日期 1983.09.13
申请人 HITACHI, LTD. 发明人 KIMURA, TAKESHI;OBAYASHI, HIDEHITO;MOCHIJI, KOZO
分类号 G03F1/00;G03F1/22;G03F1/68;H01L21/027 主分类号 G03F1/00
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