DEVICE FOR AUTOMATIC COMPENSATION AND CONTROL OF PLATING CURRENT

摘要

PURPOSE:To improve the quality and corrosion resistance of plating and to improve electrode efficiency by controlling the distribution rate of plating to each plating cell according to the tracking of a strip so that plating current density can be controlled in a prescribed range. CONSTITUTION:A titled device is provided with a selection circuit 13 which selects the plating cells 3a-d to be conducted with electricity according to a line speed in prescribed order and a control circuit which compensates the excess or shortage of the coating weight of plating arising in the stage of changing the number of the cells. The above-described control circuits controls the distribution rate of the plating current to the cells 3a-d according to the tracking of a strip 1. The circuit controls the current according to the result obtd. by comparing the total sum of the plating current supplied to the cells 3a-d and the current reference compensated so as to obtain the plating current density in a prescribed range in accordance with the line speed of the strip 1.