| 摘要 |
PURPOSE:To improve resistance to heat, chemicals and water, to decrease sticking of impurities, etc. and to enable holding of an image having good quality for a long period of time by forming a water repellent polymer film obtd. by plasma polymn. of an org. monomer on the surface of a photosensitive body. CONSTITUTION:The water repellent polymer film 4 obtd. by plasma CVD using an org. monomer is formed on the surface. A silicon org. monomer or fluorocarbon org. monomer is preferably used as the org. monomer. Water absorbancy which is the cause for the deterioration of the image quality of an a-Si photosensitive body and the consequent adsorption of dust and impurities are prevented by providing such film 4 on, for example, an a-Si photosensitive layer 2. The image having good quality is thus maintained for a long period of time. Such film 4 has good fitness to a toner and has a small coefft. of friction to permit easy slipping of photosensitive paper and therefore the image having good quality is held for a long period of time. The similar effect is obtainable by using the film 4 for a photosensitive body, etc. using Se, etc. |
