| 摘要 |
PURPOSE:To form stably the titled thin film having high internal stress by forming firstly a thin film under unbiased conditions of a substrate, and then impressing a high-frequency bias voltage of form a thin film when a vapor-deposite film is formed on the surface of the substrate by sputtering. CONSTITUTION:A substrate 4 of a slide glass is placed on a substrate holder 5 which is rotated by a motor 7 in a vacuum vessel 1. A target 6 made of Mo is fixed above the substrate 4, and the inside of the vacuum vessel 1 is made vacuum by evacuation. Gaseous Ar is introduced, and a high voltage is impressed to the Mo target from a DC electric power source 11 to generate magnetic discharge. Accordingly, an Mo vapor-deposited film 12 is formed on the substrate 4 under unbiased conditions. Then a high-frequency bias voltage is impressed to the target 6 with a changeover switch 10 from a high-frequency electric power source 9 to form an Mo vapor-deposited film 13, and an Mo vapor-deposited film having high internal stress can be stably formed. |
