| 发明名称 |
PROCESS FOR MAKING A LITHOGRAPHIC MASK |
| 摘要 |
In a self-development process for making a lithographic mask, the radiation sensitive layer comprises capped polyphthalaldehyde and an onium salt sensitizer. |
| 申请公布号 |
EP0126214(A3) |
申请公布日期 |
1986.02.05 |
| 申请号 |
EP19840101445 |
申请日期 |
1984.02.14 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ITO, HIROSHI;WILLSON, CARLTON GRANT |
| 分类号 |
G03F7/09;G03F1/68;G03F7/039;H01L21/027 |
主分类号 |
G03F7/09 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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