发明名称 SPUTTERING METHOD
摘要 PURPOSE:To execute a stable thermal pressure welding by executing a sputter by mixing O2 in a sputter gas Ar. CONSTITUTION:Magnetic head parts 2-4 consisting of ceramic or ferrite are placed on a table 11 of a sputter device, a degree of vacuum of a sputter chamber 7 is set to 3X10<-4>Pa by a vacuum pump 12, and a mixed gas of Ar and O2 is led into the sputter chamber 7 from a gas bomb 6. Subsequently, electric power of 150W is supplied to a target glass 8 from a power source 9, and a sputter is executed about 1.5hr. By setting a ratio of Ar and O2 to 95:5-90:10, a composition of PbO can be stabilized, a variation of a composition of a lead glass thin film 1 is suppressed, and a stable thermal pressure welding can be executed. As a result, the composition of the lead glass thin film becomes constant, and an adhesion failure can be prevented, and the yield is improved.
申请公布号 JPS6199911(A) 申请公布日期 1986.05.19
申请号 JP19840220206 申请日期 1984.10.19
申请人 HITACHI METALS LTD 发明人 MORITA SHIGETOSHI;SHIMIZU YOSHIRO;GOTO MAKOTO;MIKAMOTO TSUKASA
分类号 C23C14/08;C23C14/00;G11B5/127 主分类号 C23C14/08
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