| 摘要 |
PURPOSE:To decrease the out of focus of a vapor deposition pattern in a mask for vapor deposition provided with plural apertures to a metallic flat plate by providing notches from >=1 apertures to the end of the metallic flat plate to said mask. CONSTITUTION:Vapor deposition is executed by using the mask for vapor deposition provided with the plural apertures having a desired size to the metallic flat plate 1 consisting of a stainless steel having a prescribed size and thickness. The notches 3 extending from the apertures 2 of the mask to the end of the plate 1 and along the straight line passing approximately the center of the plate 1 are provided to the mask. The respective parts cut by the notches 3 of a peripheral part 1a move outward with respect to the central part of the plate 1 even if partition parts 1b are heated to the temp. higher than the temp. of the peripheral part 1a and the rate of thermal expansion of the former is larger than the rate of thermal expansion of the latter when the mask is heated. The difference in the rate of thermal expansion between the partition parts 1b and the peripheral part 1a is therefore absorbed by the deformation of the peripheral part 1a by the notches 3, by which the mask is surely and tightly adhered to a substrate for vapor deposition.
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