发明名称 FORMATION OF PATTERN
摘要 PURPOSE:To easily form a fine pattern with submicron order dimension by a method wherein the energy ray, which is modulated in accordance with the information to be patterned, on the surface of a base body, and then, the base board undergoes the etching process. CONSTITUTION:The input signals 1 of the information to be recorded are fed to the energy ray generator 3 through the modulator 2. The energy ray 4 is irradiated onto the surface of the base body 6 which moves along the arrow 5. A section to be irradiated 7 and a section not to be irradiated 8 are formed on the surface of base body 6 in accordance with the information to be recorded. Then, when the surface of the base body 6 undergoes the evaporation process, the part corresponding to the irradiation part 7 is not evaporated, and the part corresponding to the non-irradiation part 8 is evaporated (evaporation forming part 9).
申请公布号 JPS61139028(A) 申请公布日期 1986.06.26
申请号 JP19840261400 申请日期 1984.12.11
申请人 FUJI PHOTO FILM CO LTD 发明人 ARAI YOSHIHIRO;SHIRAHATA RYUJI;KITAMOTO TATSUJI
分类号 H01L21/302;H01L21/263;H01L21/268;H01L21/3065;H01L21/311;H01L21/312;H01L21/3205;(IPC1-7):H01L21/302 主分类号 H01L21/302
代理机构 代理人
主权项
地址