| 摘要 |
PURPOSE:To obtain a complete vertically magnetized film from the interface with a substrate without impressing a bias voltage by forming a magnetic layer consisting of a Gd-Tb-Co ternary amorphous magnetic alloy having an axis easy for magnetization in the direction vertical to the film surface by sputtering at lower than the time-constant pressure. CONSTITUTION:The sputtering pressure during sputtering is regulated to <=1X10<-2>Torr. For example, after the inside of a chamber is evacuated to <=1X10<-7>Torr vacuum, gaseous Ar is introduced, the Ar pressure is regulated to 8X10<-3>Torr by operating the main valve in an evacuation system and a film is formed at 300W sputtering electric power. The obtained magnetic film having 1,200Angstrom thickness has an axis easy for magnetization in the direction vertical to the film surface, the film is amorphous by an X ray, and the composition of the target is (Gd0.84Tb0.16)0.20Co0.80 in an area ratio. At <=1X10<-2>Torr sputtering pressure, a complete vertically magnetized film can be obtained from the interface with the substance without impressing a bias voltage.
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