| 摘要 |
PURPOSE:To make the thickness of a vapor-deposited film uniform and to improve the deposition efficiency by reducing the shifting of the vapor jet direction from the perpendicular to a substrate which increases as the vapor approaches the periphery of the substrate by a specified means. CONSTITUTION:The vapor 20 of a vapor deposition material which is divergently injected from a small hole 12 of a vapor generator 5 is deposited in a high- vacuum region on a substrate 19 which is arranged oppositely to the small hole 12 in a vapor deposition device. An annular electrode 41 is arranged between the vapor generator 5 and the substrate 19 and the shifting of the vapor jet direction from the perpendicular to the substrate which increases as the vapor approaches the periphery of the substrate 19 is reduced by the electric field impressed on the electrode 41.
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