发明名称 Semiconductor devices employing Fe-doped MOCVD InP-based layer for current confinement
摘要 High resistivity Fe-doped InP-based MOCVD layers are used to constrain current to flow through the active region of a variety of devices such as CSBH and DCPBH lasers.
申请公布号 US4660208(A) 申请公布日期 1987.04.21
申请号 US19840621071 申请日期 1984.06.15
申请人 AMERICAN TELEPHONE AND TELEGRAPH COMPANY, AT&T BELL LABORATORIES 发明人 JOHNSTON, JR., WILBUR D.;LONG, JUDITH A.;WILT, DANIEL P.
分类号 H01L21/205;H01L33/00;H01L33/24;H01S5/00;H01S5/223;H01S5/24;(IPC1-7):H01S3/19 主分类号 H01L21/205
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