发明名称 |
Photolithographic method and combination including barrier layer |
摘要 |
Photolithographic methods employing a photoresist layer and a contrast enhancing photobleachable layer deposited thereon have certain disadvantages including compatibility and the tendency toward scum formation during stripping of the photobleachable layer. These problems are alleviated by the deposition of an aqueous alkali-soluble polymeric barrier layer such as poly(vinyl alcohol), which is removed simultaneously with the alkaline development step for the photoresist. In a preferred embodiment, the polymeric binder for the photobleachable layer is also water-soluble and is also removed simultaneously with development.
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申请公布号 |
US4663275(A) |
申请公布日期 |
1987.05.05 |
申请号 |
US19840647295 |
申请日期 |
1984.09.04 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
WEST, PAUL R.;DAVIS, GARY C. |
分类号 |
G03F7/095;G03C1/00;G03C5/00;G03F7/09;G03F7/11;G03F7/26;H01L21/027;(IPC1-7):G03C1/495;G03C1/727 |
主分类号 |
G03F7/095 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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