| 摘要 |
PURPOSE:To accurately determine the end of an etching process by a method wherein a heating means is provided on the wall of a reaction container. CONSTITUTION:A heating wire 7 is provided on the outer wall of a chamber 1 opposite to a termination detecting sensor 5 so that the emission spectrum of plasma generated in the chamber 1 may reach the termination detecting sensor 5 without being shielded by the heating wire 7. The inside wall of the chamber 1 is warmed when an electric current is applied to the heating wire 7 attached to the chamber 1, which prevents etching-created products from adhering to the inner wall of the chamber 1. This ensures accurate detection of the end of etching.
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