SUBSTRATE MASK FOR SPUTTERING APPARATUS

摘要

PURPOSE:To reduce the curvature of a substrate mask due to heat during sputtering and to produce a satisfactory masking effect by heat treating the mask at a temp. above the temp. of a substrate during sputtering. CONSTITUTION:A substrate 3a of alumina or the like having a formed electrode is fitted to a substrate holder 3 and a substrate mask 5 is fixed on the surface of the substrate 3a through mask supports 4. The mask 5 is made of stainless steel or the like and heat treated beforehand at a temp. above the temp. of the substrate 3a during sputtering to relieve the internal residual stress. Thus, the curvature of the mask 5 due to the heat of the substrate 3a during sputtering is reduced, a satisfactory masking effect is produced and a thin film having high dimensional accuracy can be formed.