| 摘要 |
PURPOSE:To obtain a film of a uniform thickness by sputtering by extending a circular magnetic field region formed over the surface of a target on both sides of a base material in the lateral direction so as to make the amount of metallic particles flying from the target uniform over the whole region of the base material. CONSTITUTION:A target 28 is placed opposite to a base material 22 traveling in a vacuum vessel 21. Magnets 34, 35 having different polarities are arranged on the rear side of the target 28 so that a circular magnetic field region 75 is formed between the magnets 34, 35. At this time, the area of each of parts of the region 75 on both sides of the base material 22 in the lateral direction is made larger than the area of the remaining part.
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