| 摘要 |
PURPOSE:To perfectly remove abrasive powder from the surface of a substrate for a magnetic disk without scratching the surface by using a specified composition contg. colloidal silica and an anionic surfactant as a detergent for scrubbing the substrate after polishing. CONSTITUTION:A composition consisting of 1-20% colloidal silica of >=0.02mum average particle size, 0.1-2.0% anionic surfactant and the balance water with impurities is used as a detergent for scrubbing a substrate for a magnetic disk after polishing. Abrasive powder can be perfectly removed from the surface of the substrate without scratching the surface, resticking or other trouble is not caused and a significant cleaning effect is produced.
|
