| 摘要 |
PURPOSE:To make a high-speed and efficient treatment of a photoresist by UV irradiation by selectively shielding or attenuating the whole or part of the exposing sensitive wavelength of the photoresist among the radiation wavelengths from a microwave excited non-electrode discharge lamp. CONSTITUTION:A strong microwave magnetic field is formed in a cavity resonator 23 and the gas in the non-electrode discharge lamp 1 is excited by the strong microwave magnetic field, by which the radiation light contg. UV rays is radiated. The radiation light from the non-electrode discharge lamp 1 is irradiated as the radiation light contg. the UV rays of a suitable wavelength by a filter 3 or the like onto the photoresist 4. A filter having the characteristic to shield or attenuate the light of 300-500nm which is the wavelength region including the exposing sensitive wavelength of the photoresist is used as the filter 3 in an example of the radiation spectra of the non-electrode discharge lamp 1. The photoresist treatment by the UV irradiation is thereby effectively executed.
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