| 摘要 |
PURPOSE:To unify the electric field intensity between electrode plates by a method wherein a region of electrode plate mounting a semiconductor substrate is insulated from the other regions while the voltage impressed upon respective regions are controlled. CONSTITUTION:Within a pair of parallel electrode plates 1, a part mounting a semiconductor substrate 2 and the other parts are electrically insulated from each other by insulators 6. Electric field measuring devices 3 measure the electric field intensity on the parts perpendicular to the surface of semiconductor substrate 2 and the other parts to input the measured output signals (a) to a controller 4. The controller 4 controls the output voltage from high-frequency oscillators 5 so that the electric field intensity between the electric plates 2 perpendicular to the surface of substrate 2 may be equalized to that of any other parts. Through these procedures, the etching rate can be prevented from being differentiated between the central part and the peripheral part of substrate 2 making it feasible to form even films.
|
