发明名称 THIN FILM FORMING DEVICE
摘要 PURPOSE:To provide a thin film forming device which stabilizes the load of a crucible heating power source by constituting the device in such a manner that a circuit for setting and controlling crucible heating electric power for a metal for vapor deposition measures or calculates the electric power, voltage and current for heating the crucible and controls filament current for emitting crucible heating electrons to attain the prescribed values of the crucible heating current and voltage. CONSTITUTION:The metal 2 is molted in the crucible 1 having a small hole 3 in the upper part and the metallic vapor is injected from the small hole 3 into a vacuum and is ionized so that the ions are deposited by evaporation on a substrate 10. The electric power value of the power source 14 is inputted every time when the voltage of the heating power source 14 attains the specific value in the process for gradually supplying the crucible heating electric power in the closed state of a shutter 29 prior to the start of the vapor deposition. The input value is compared with the current value in the stable state of the crucible heating power source and the current value of the filament power source for emitting thermoelectrons for the purpose of heating the crucible is calculates 25 and outputted. Since the voltage value and current value of the crucible heating power source are controlled to the stable state of the crucible heating power source by the above-mentioned method, the overcurrent and overvoltage state of the crucible power source is no longer generated and the trouble of the crucible heating power source is eliminated.
申请公布号 JPS62247066(A) 申请公布日期 1987.10.28
申请号 JP19860088351 申请日期 1986.04.18
申请人 MITSUBISHI ELECTRIC CORP 发明人 FUKUDA SHIRO
分类号 C23C14/30;C23C14/32;C23C14/54 主分类号 C23C14/30
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