CVD THIN FILM FORMATION APPARATUS

摘要

PURPOSE:To enable any residual SiO2 in a reactor to be exhausted out of the reactor very easily by a method wherein the reactor is arranged in a sealed up chamber fed with purified air such as a clean room or a clean venturi unit. CONSTITUTION:A reactor 1 is arranged in a reactor installation part 22 in a chamber 20 to be sealed up. The chamber 20 to be sealed up is e.g. a clean venturi unit or a clean room etc. provided with an airtight door freely opened and closed for taking in and out the reactor 1 as well as for carrying in and out a wafer while arranged with an air feeding duct 24 on the upper part of chamber 20. Furthermore, a dust arresting filter 26 is arranged between the duct 24 and the reactor installation part 22. On the other hand, an exhaust duct 28 connected to a proper exhaust fan or pump is arranged on the lower part of chamber 20 or the reactor installation part 22.