发明名称 Process for forming deposited film
摘要 A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing carbon and a halogen and an active species (B) formed from a chemical substance for film formation which is reactive with said active species (A) separately from each other, and then allowing both the species to react with each other thereby to form a deposited film on the substrate.
申请公布号 US4717585(A) 申请公布日期 1988.01.05
申请号 US19860826898 申请日期 1986.02.06
申请人 CANON KABUSHIKI KAISHA 发明人 ISHIHARA, SHUNICHI;OHNO, SHIGERU;KANAI, MASAHIRO;ODA, SHUNRI;SHIMIZU, ISAMU
分类号 C23C16/22;C23C16/452;H01L21/205;(IPC1-7):B05D3/06 主分类号 C23C16/22
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