| 发明名称 |
PHOTOSENSITIVE CONTRAST REINFORCING COMPOSITION AND DETERMINATION OF PATTERN FOR PHOTORESIST LAYER |
| 摘要 |
A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt. |
| 申请公布号 |
JPS6313029(A) |
申请公布日期 |
1988.01.20 |
| 申请号 |
JP19870159499 |
申请日期 |
1987.06.26 |
| 申请人 |
TEXAS INSTR INC <TI> |
发明人 |
JIYON BII KOBINGUTON;BITSUKU BII MARIOTSUTO;RARII JII BENABURU;PIITAA KIMU |
| 分类号 |
G03F7/095;G03C1/00;G03F7/00;G03F7/004;G03F7/09;G03F7/11;G03F7/26;H01L21/027 |
主分类号 |
G03F7/095 |
| 代理机构 |
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代理人 |
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