发明名称 ION BEAM PROFILE MEASURING APPARATUS
摘要 PURPOSE:To determine an ion distribution within an ion beam, by inserting a plurality of probes so as to divide the cross-section of an ion beam to be measured into small area regions. CONSTITUTION:An accelerated ion beam 7 is irradiate into a vacuum tank 6. Probes 8 are inserted into the vacuum tank 6 and mounted on a probe support rod 9 made of stainless steel material as electrically insulated. The inserting depth of the probe support rod 9 is adjusted with a motor 10. Moreover, the probes 8 are connected separately to an ammeter and a voltmeter outside the vacuum tank 6. Then, as an ion beam 7 reaches a number of probes 8, the probes 8 occupy small areas of the ion beam 7 separately. The respective probes 8 detect ion currents at small area parts. Thus, the informations on the ion currents at the respective small area parts are analyzed comprehensively thereby enabling he determination of an ion distribution within the ion beam 7.
申请公布号 JPS6395377(A) 申请公布日期 1988.04.26
申请号 JP19860241651 申请日期 1986.10.09
申请人 MITSUBISHI ELECTRIC CORP 发明人 MIYATA KAZUAKI;JIYONASAN DEIBITSUTO BASUKIN
分类号 G01T1/29;H01J37/04;H01J37/317;H01L21/265 主分类号 G01T1/29
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