发明名称 VAPOR PHASE EPITAXY DEVICE
摘要 PURPOSE:To equalize the heating temperature in a substrate by a method wherein a substrate mounting region of susceptor and another region around the former region are respectively formed of high-frequency induction heating members in different resistance values. CONSTITUTION:A substrate mounting region 12 is formed of a circular plate type graphite sheet in specific resistance of 1700OMEGA-cm while another region 13 around the substrate mounting region 12 is formed of a flat plate type graphite sheet in specific resistance of 700OMEGA-cm. Thus, the region 13 around the region 12 in low specific resistance is supplied with more high-frequency current than that of substrate mounting region 12 in higher specific resistance value so that the substrate mounting region 12 may be supplied with less high-frequency current even if the region 12 is given effect of radient heat from said region 13. Through these procedures, the heating temperature extending over all regions of susceptor 11 can be equalized.
申请公布号 JPS63204618(A) 申请公布日期 1988.08.24
申请号 JP19870036991 申请日期 1987.02.19
申请人 FUJITSU LTD 发明人 MARUYAMA KENJI;ITO MICHIHARU;YAMAMOTO KOSAKU;SAITO TETSUO;HIROTA KOJI
分类号 H01L21/205;H01L21/365 主分类号 H01L21/205
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