| 摘要 |
PURPOSE:To preclude the danger of development irregularity generation by using a developer with low concentration in the beginning of development and increasing the developer concentration continuously up to maximum concentration. CONSTITUTION:While a substrate 1 is rotated by a motor 2, the developer which is 100% pure water at the start and increased in concentration gradually to prescribed concentration at time t1 is injected from a nozzle 4. Then the developer is held at 1st optimum prescribed concentration after time t1 and an arithmetic circuit 9 sends a signal to a control circuit 10 at time t2 when a diffracted light intensity ratio I1/I0 reaches 0.133 to give a gradient after the time t2 and reduce the developer concentration gradually by controlling plugs 12 and 15. When the 2nd prescribed concentration is reached, the 2nd prescribed concentration is held after time t3. Then the development is finished when the I1/I0 reaches 0.2, so time t4 is detected by the arithmetic circuit 9 and a signal is sent to the control circuit 10, so that a washing process is entered. Consequently, even if there is an irregularity in development, an excellent developed substrate whose border is not conspicuous is obtained. |
