发明名称 ION BEAM SHOTTING METHOD
摘要 PURPOSE:To reduce the number of drawing tables and to make the work easier by reading the data set in the addresses automatically in order from a memory in which the shot amount data are stored, every time reading the variable shot code data responding the every shot rank, and shotting the ion beam. CONSTITUTION:In a variable shot rank table 19, the data v1, v2,... responding to the shot time stopping at a certain point in order are set to the addresses 1, 2,..., and in a drawing table 18 in which the data with respect to the shot position and the shot amount of a pattern in each chip are set, a variable shot code data 77 are set as a shot rank data of the pattern the shot amount is desired to be variable. Every time when the variable shot code data 77 is read, a data at the address in a regular order is read from a memory 17 where shot amount data u1, u2,... are stored responding to the shot rank 1, 2,..., automatically in order, and depending on the read out shot amount u1, u2,..., the ion beam is shotted at a specific position on the sample. Therefore, the ion drawing table 18 is not necessary to be made in the number responding to the number of chips, but a single drawing table will do.
申请公布号 JPS63218141(A) 申请公布日期 1988.09.12
申请号 JP19870051577 申请日期 1987.03.06
申请人 JEOL LTD 发明人 MANABE HIRONOBU;HITOSUGI AKIO
分类号 H01L21/265;H01J37/305;H01J37/317;H01L21/027;H01L21/30 主分类号 H01L21/265
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