| 摘要 |
PURPOSE:To detect a mark for positioning accurately and rapidly by changing the position of a substrate when a film is removed through a film removal means and when the mark is detected through a mark detecting means. CONSTITUTION:A substrate 14 is displaced previously so that a light irradiation region for removing a photoresist on the substrate 14 is brought onto a light transmission section, to which a pattern is not formed, on the substrate 14 on light irradiation for removing the photoresist. The substrate 14 is shifted where capable of positioning by an optical system and positioning marks 14a-1, 14a-2, 16a-1, 16a-2 on positioning. The substrate is moved during that time by driving a substrate stage 30 by a substrate stage driver 31 by a command from a CPU 40. When an XY interferometer is used for measuring the position of the substrate at that time, the movement of the substrate can be controlled with precision sufficient for positioning after light irradiation for removing the resist. Accordingly, the adverse effect of a photosensitive body film at the time of positioning in an exposure device is eliminated and the substrate can be positioned accurately, thus improving throughput. |
