发明名称 MANUFACTURE OF SEMICONDUCTOR LASER DEVICE
摘要 PURPOSE:To arbitrarily setting the wavelength interval and to reduce the number of epitaxial growths by placing on a GaAs substrate a pluraliry of active layers of the AlGaAs, InGaAsP and AlGaInP systems and simultaneously forming a lateral buried layer. CONSTITUTION:On a GaAs substrate 1, an AlGaAs clad layer 2, AlGaAs active layer 3 and AlGaAs clad layer 4 are grown by a liquid phase growth method to a Ga solvent. Part of them is etched away, a p-InGaAsP layer is epitaxially grown by a liquid phase growth method of an In solvent, and an n-InGaP clad layer 5, an InGaAsP active layer 6 and a p-InGaP clad layer 7 are grown. Then a mesa etching is applied in stripes, a p-InGaP buried layer 8 and an n-InGap buried layer 9 are grown, and the individual elements are isolated by isolation etching, thereby making a multiple-wavelength laser wherein arbitrary wavelengths are combined.
申请公布号 JPS63228791(A) 申请公布日期 1988.09.22
申请号 JP19870062945 申请日期 1987.03.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SERIZAWA AKIMOTO;HORI YOSHIKAZU;MATSUI YASUSHI;UNO TOMOAKI;ODANI JIYUN;YAMAMOTO HIROAKI
分类号 H01L21/205;H01S5/00 主分类号 H01L21/205
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