| 摘要 |
PURPOSE:To prevent defective vapor deposition and formation of a defective vapor-deposited film by evacuating the inside of a vacuum chamber, preheating the inside of the vacuum chamber before a vapor-phase metal is generated to generate a gas and providing a mechanism for sorbing the gas. CONSTITUTION:When vacuum deposition is carried out, the inside of the vacuum chamber 1 is firstly evacuated to about 1X10<-2>Torr by a rotary pump 4 and then evacuated to about 1X10<-3>Torr by jointly using a mechanical booster pump 3 and a diffusion pump 2. An electric current is applied respectively to the filament 5' in a sorption chamber 9 and to the filament 5 in the vacuum chamber 1 from an electric power source 12 through a current rectifier 11. Consequently, a gas is stripped from the inner wall and a base material 8 in the vacuum chamber 1, and the gas and the remaining gas are sorbed by the sorption metal 6' in the sorption chamber 9 through a porous partition wall 10. When sorption is finished, the vacuum in the vacuum chamber 1 is rapidly increased to 1X10<-4>Torr, and vapor deposition is started at this time. By this method, an excellent thin metallic film can be formed on the base material 8.
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