发明名称 VAPOR PRESSURE CONTROLLING DEVICE
摘要 PURPOSE:To obtain a stable vapor pressure, by making a large quantity of gas pass by way of a gas flow rate controller to a container in which a material to be vaporized is housed and next sending the prescribed gas into a shunt. CONSTITUTION:For example, a carrier gas 1 of 100cc/min is produced in a gas flow rate controller 2, and this gas is sent into a material 4 to be vaporized, which exists in a bubbler 3, through a glass tube 8, so that many bubbles 10 are formed by the sent gas. The flow rate of carriers is too large when this state is left as it is. Therefore, if the gas is made to pass through a shunt 6 and its ratio of division is formed into 1:99, an aimed gas of 1 cc/min can be obtained. Even in the case of supplying a small amount of carriers where stable bubbles are not obtained, the carrier gas 1 can be made to flow in quantity into the bubbler 3, and so a vapor pressure control in the gas can be stably performed.
申请公布号 JPS63232316(A) 申请公布日期 1988.09.28
申请号 JP19870064179 申请日期 1987.03.20
申请人 FUJITSU LTD 发明人 MARUYAMA KENJI
分类号 H01L21/31;H01L21/205 主分类号 H01L21/31
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