| 摘要 |
PURPOSE:To obtain a positive resist compsn. developed in aq. alkali, having high sensitivity and high resistance to oxygen plasma by constituting a resist material comprising a specified polymer contg. a specified siloxane polymer and an onium salt, which is added to the compsn. in accordance with demand. CONSTITUTION:A resist material is prepd. by mixing a polymer expressed by formula II contg. an onium salt in accordance with demand, for prepg. a positive resist having high sensitivity, with a siloxane polymer expressed by formula I for the purpose of improving the resistance to oxygen plasma. In formula I, X is a carboxyl group, etc.; R'-R''' are OH group, alkyl group or phenyl group; l-n are zero or a positive integer. By this constitution, positive sensitivity for energy beams such as electron beams, X-rays, far ultraviolet rays, is obtd. Moreover, formation of pattern without generating swelling is possible since the compsn. can be developed using aq. alkali. |
