| 摘要 |
PURPOSE:To simplify and shorten a process, by forming a main magnetic pole so as to thin the film thickness of the tip part of a magnetic pole and to thick that of another part by applying etching elimination to form a prescribed film thickness setting an inter-layer insulating layer on a conductor coil layer as a mask pattern. CONSTITUTION:A thick magnetic film 31 for forming the main magnetic pole is formed on a substrate 11, and the conductor coil layer 16 sandwiched by the inter-layer insulating layers 15 and 17 is formed on an area except a part scheduled to form the tip of the magnetic pole of the magnetic film 31. Next, the main magnetic pole 32 in which the film thickness at the tip part of the magnetic pole is formed thinly and that of another part thickly is formed by applying the etching elimination of an exposed magnetic film 31 pare to form the prescribed film thickness setting the inter-layer insulating layers 15 and 17 sandwiching the conductor coil layer 16. Afterwards, on the inter-layer insulating layer 17, an upper magnetic pole 18 with a form in which the tip of the magnetic pole recedes by a prescribed size from a plane confronting with a medium is formed laminatedly. In such a way, it is possible to simplify the forming process of the main magnetic pole 32 of thick pattern shape, only the tip part of the magnetic pole of which is made into a thin film partially. |
