发明名称 PREPARATION OF CHOCOLATE USING PHOTO-SENSITIVE POLYMER
摘要 PURPOSE:To easily prepare the titled product having extremely delicate uneven surface pattern of picture, photography, etc., at a low cost, by exposing a photo- sensitive polymer with light transmitted through a transparent master plate to form an unevenness on the surface of the polymer and using the polymer plate as a molding plate. CONSTITUTION:A transparent master plate 10 having a pattern of picture or design, etc., is placed on a photo-sensitive polymer layer 23 of a polymer plate 20 and the photo-sensitive polymer layer 23 is exposed with light transmitted through the master plate 10. The exposed photo-sensitive polymer 23 is fixed to form an unevenness on the surface. The polymer plate 20 having the photo- sensitive polymer layer 23 is combined e.g. with a holding plate 30, a frame 32 and a holding tool 33 to form a forming mold. The objective chocolate is prepared by using the mold.
申请公布号 JPS6451044(A) 申请公布日期 1989.02.27
申请号 JP19870207839 申请日期 1987.08.21
申请人 HANTAA SEIKA KK;FUJISHIMA TOSHIYA 发明人 YANAGISAWA KAZUYOSHI;FUJISHIMA TOSHIYA
分类号 A23G1/30;A23G1/00;G03F7/00;G03F7/26 主分类号 A23G1/30
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