| 发明名称 |
IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE |
| 摘要 |
The present invention provides an imprint apparatus which molds an imprint material using a mold to form a pattern on a substrate, the apparatus including a nozzle including a discharge outlet which discharges the imprint material onto the substrate, a holding unit configured to hold the mold, a supply unit configured to supply a gas which accelerates filling of a pattern of the mold with the imprint material to a portion between the holding unit and the imprint material on the substrate, and a gas unit provided with the nozzle, wherein the gas unit performs gas supply or exhaust with respect to a second space around a first space between the nozzle and a portion of the substrate which faces the nozzle and is conveyed under the nozzle in order to suppress the gas from flowing into the first space. |
| 申请公布号 |
US2016375627(A1) |
申请公布日期 |
2016.12.29 |
| 申请号 |
US201514902359 |
申请日期 |
2015.03.10 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Matsumoto Hideki;Saku Tomonobu |
| 分类号 |
B29C59/02;G03F7/00;B29C31/00;H01L21/683;B29C59/00;H01L21/67 |
主分类号 |
B29C59/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An imprint apparatus which molds an imprint material on a substrate using a mold to form a pattern on the substrate, the apparatus comprising:
a nozzle including a discharge outlet which discharges the imprint material onto the substrate; a holding unit configured to hold the mold; a supply unit configured to supply a gas which accelerates filling of a pattern of the mold with the imprint material to a portion between the holding unit and the imprint material on the substrate; and a gas unit provided with the nozzle, wherein the gas unit performs gas supply or exhaust with respect to a second space around a first space between the nozzle and a portion of the substrate which faces the nozzle and is conveyed under the nozzle in order to suppress the gas from flowing into the first space. |
| 地址 |
Tokyo JP |
